In microfabrication, lithography is used to create detailed patterns in a substrate. It is the first step in structuring the glass or silicon wafers, and thus basically forms the heart of the process.
The partial structuring of surfaces using a light-sensitive layer (photoresist) is a process that is almost fully automated, which leads to a stable, fast, and accurate procedure. Light-sensitive layers are usually deposited by spin coating, a common technique that works perfectly on smooth surfaces. If the substrate already contains a 3D structure on which the photoresist has to be applied, spray coating is a better option.
Typical lithography processes operate within a range of 5 µm. If a more detailed result has to be achieved, Micronit has other techniques at hand, like nanopatterning. Nanoimprint lithography (NIL) is a method of patterning on the nanometre scale. At Micronit, we have a lot of experience with the nanopatterning of flow cells for DNA sequencing. But other applications, such as LEDs, lab-on-a-chip, integrated photonics, high-density memory, bio-applications, and micro-needles also are typically produced using nanoimprint lithography.