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Lithography processes

The selective editing of surfaces with photo-sensitive layers is a process that is almost fully automated. This means that scalability, accuracy and precision are optimised. Which results in the follow-up processes, based on the photosensitive layer, getting the required reliability that operating applications need for medical and industrial use. Micronits classic lithography processes normally operates within a range of 5mu, but there are other techniques when a much finer structure is required.

The photosensitive layer is added by spinning or spray coating. A spin coating is the most widely used technique and works perfectly on smooth surfaces. Spray coating, on the other hand, is a better fit if there already is a 3D structure on which the photosensitive layer needs to be applied.


Nanoimprint lithography is a technique that allows us to make feature sizes from around 200 nm. An very interested upcoming field for nanoimprinting is nanopatterned flowcells for gene sequencing. But also applications such LEDs, lab-on-a-chip, integrated photonics, high-density memory, bio-applications,  and micro-needles are typical examples for which nanoimprinting is used.